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A study of the T2 defect and the emission properties of the E3 deep level in annealed melt grown ZnO single crystals

机译:退火熔融生长ZnO单晶中T2缺陷及E3深能级发射特性的研究

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摘要

We report on the space charge spectroscopy studies performed on thermally treated melt-grownsingle crystal ZnO. The samples were annealed in different ambients at 700 C and also in oxygenambient at different temperatures. A shallow donor with a thermal activation enthalpy of 27meVwas observed in the as-received samples by capacitance-temperature, CT scans. After annealing thesamples, an increase in the shallow donor concentrations was observed. For the annealed samples,E27 could not be detected and a new shallow donor with a thermal activation enthalpy of 35meVwas detected. For samples annealed above 650 C, an increase in acceptor concentration wasobserved which affected the low temperature capacitance. Deep level transient spectroscopyrevealed the presence of five deep level defects, E1, E2, E3, E4, and E5 in the as-received samples.Annealing of the samples at 650 C removes the E4 and E5 deep level defects, while E2 alsoanneals-out at temperatures above 800 C. After annealing at 700 C, the T2 deep level defect wasobserved in all other ambient conditions except in Ar. The emission properties of the E3 deep leveldefect are observed to change with increase in annealing temperature beyond 800 C. For samplesannealed beyond 800 C, a decrease in activation enthalpy with increase in annealing temperaturehas been observed which suggests an enhanced thermal ionization rate of E3 with annealing.
机译:我们报告了对热处理的熔融生长单晶ZnO进行的空间电荷光谱研究。将样品在700°C的不同环境中以及在不同温度的氧环境中进行退火。通过电容-温度CT扫描在接收的样品中观察到浅激活供体具有27meV的热活化焓。样品退火后,观察到浅的供体浓度增加。对于退火样品,无法检测到E27,并且检测到一个新的浅供体,其热活化焓为35meV。对于在650℃以上退火的样品,观察到受体浓度的增加,这影响了低温电容。深层瞬态光谱揭示了样品中五个深层缺陷E1,E2,E3,E4和E5的存在。在650 C的温度下退火可去除E4和E5深层缺陷,而E2也可退火在高于800 C的温度下进行。在700 C退火后,在除Ar中以外的所有其他环境条件下均观察到了T2深能级缺陷。观察到E3深能级缺陷的发射特性会随着退火温度超过800 C的升高而变化。对于退火温度超过800 C的样品,观察到活化焓随退火温度的升高而降低,这表明E3的热电离速率随着退火温度的提高而提高。 。

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